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Will China obtain an EUV machine?
Before Jan 1, 2030Politics
Kalshi Active 4 markets·74¢ Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2030?·$0 Total Volume·-- Liquidity·-- OI
5mo·Jan 8, 2027

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4
Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2030
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Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2029
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Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2028
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34% ▲0.0%
Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2027
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18% ▲0.0%
Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2030
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If China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility is confirmed by any of the Source Agencies after Issuance and before Jan 1, 2027, then the market resolves to Yes.

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