Will China obtain an EUV machine?
Before Jan 1, 2030Politics
Will China obtain an EUV machine?
Before Jan 1, 2030Politics
Kalshi Actif 4 marchés·74¢ Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2030?·$0 Volume total·-- Liquidité·-- OI
5mo·Jan 8, 2027
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4Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2030
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Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2029
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Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2028
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Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2027
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Obtains develops functional extreme ultraviolet lithography capable patterning semiconductor wafers fabrication facility confirmed before Jan 2030
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If China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility is confirmed by any of the Source Agencies after Issuance and before Jan 1, 2027, then the market resolves to Yes.
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